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Omega® ICP process module is based on a well-established design incorporating a number of enhancements driven by market & customer demands.
A high density plasma source incorporating a radial coil ICP design, the SPTS ICP process module is capable of etching a wide range of materials, including:
  • GaAs
  • GaN
  • SiC
  • Si
  • AlTiC
  • SixNy

SPTS ICP process modules can be found in use for applications related to…
  • MEMS
  • Compound Semiconductors
  • Power Semiconductors

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